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High Vacuum Multi-Chamber Processing/Characterization Setup: |
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- Processing chamber
- Remote Plasma (surface cleaning, chemical and physical surface modification)
- Vacuum in situ resistive annealing
- Surface analysis
- Auger Electron Spectroscopy (surface composition, work function)
- Surface Photovoltage Spectroscopy (surface defects, surface potential)
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Optics Table: |
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- Photoluminescence Spectroscopy (optical emission of defects)
- Raman Spectroscopy (structure and deformations of chemical bonds)
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High resolution Horiba monochromator |
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Wide temperature range (7 – 300K) |
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Multiple laser beams |
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Various incidence, polarization, and detection geometries |
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